Pretreatment for Metal Contamination Analysis of Multi-layer Film
(Layer-by-layer Dissolution)



We have confirmed that it is possible to selectively and uniformly dissolve each layer of a multi-layer film consisting of poly-Si film and SiO2 film by using different dissolving liquids for different purposes. This technique can be used for a pretreatment to be carried out before the metal contamination of each layer of a multi-layer film is analyzed by inductively coupled plasma mass spectrometry (ICP-MS method).


・The 2-layer film having a structure as shown in the figure was dissolved in the following two ways:

A: Dissolved in a newly developed liquid and hydrofluoric acid
B: Dissolved in fluonitric acid (liquid mixture of hydrofluoric acid and nitric acid)
*Fluonitric acid is a general dissolving liquid for poly-Si film.

・After the dissolution treatment, the cross section was observed with a scanning electron microscope (SEM), and the surface roughness was measured with a scanning probe microscope (SPM).


Search Number 3018

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