Quantitative Determination of Trace Elements
in High Salt Concentration



  • An issue to be addressed in relation to the quantitative determination of the trace metals/inorganic elements in the polishing bath that is used in CMP is interference or contamination by the main components (%) such as silicon.
  • We will use a new model of equipment using emission spectrometry that shows an improvement in the throughput of emission detection to determine the amount of trace elements up to 10ppb. Emission spectrometry is relatively resistant to contamination.

Throughput by a new type of torch

  • It has become possible to increase the amount of photons that enter the detector by changing the type of the optical plasma observation zone from vertical to transverse.
  • An improvement has been made by use of an air knife to better the rise of the background due to self-absorption.

Quantitative determination of trace elements in high salt concentration

High concentration salt: 3% sodium hydroxide (simulated solution)
・Generally, the ICP-MS method is applied to the quantitative determination of trace amounts of inorganic/metal elements. However, when a component in the order of percent like this system is present, there will be a serious contamination of the detection system, and therefore it becomes very difficult to apply the ICP-MS method.

・The use of emission spectrometry to which an improvement has been made as described above has made the lower determination limits as shown in the table on the right possible.

Search Number 3013

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