Analysis of Airborne Molecular Contaminations(AMCs) in a Clean Room(Analysis of Acids, Bases and Metals)

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Summary

Airborne molecular contaminants (AMCs) in a clean room is one of key factors for the production of high integrated semiconductor.

Acids, bases and metals among AMCs can be absorbed by a solvent in an absorption bottle(the solvent absorption method) and analyzed by Ion Chromatography and ICP/MS.

Procedure

Sampling(Solvent Absorption ) → Analysis of the solution

【Acids and bases】
Quantified by Ion Chromatography as an anion and a cation.

【Metals】
Quantified by ICP/MS.

※Sampling is proceeded by an exclusive kit

Control level of AMCs

YEAR OF PRODUCTION 2003 2005 2007
DRAM 1/2 PITCH (nm) 100 80 65
Wafer Environment Control
Critical particle size (nm) 52 38 33
# Particles > critical size ( /m2 3 2 1
Airborne Molecular Contaminations:AMCs (ppt)
Lithography-bases (as amine, amide, or NH3 ) 750 750 < 750
Gate-metals(as Cu,E=2×10-5 0.15 0.1 < 0.07
Gate-organics(as molecular weight greater than or equal to 250,E=1-3×10) 80 60 50
Organics(as CH4 1440 1100 < 900
Salicidation contact-acids(as Cl-,E=1×10-3 10 10 < 10
Salicidation contact-bases(as NH3,E=1×10-6 12 8 < 4
Dopants(P or B) < 10 < 10 < 10

※E: attachment coefficient The International Technology Roadmap for Semiconductors : 2001

Search Number 3003

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